http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021073718-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26c475bcbe0c24b485b6f37c45cd921f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2019-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62ccc89d8eea833d8a803464edcf44c9 |
| publicationDate | 2021-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021073718-A1 |
| titleOfInvention | Photoresist stripping composition |
| abstract | The present invention provides a photoresist stripping agent obtained using a reduced amount of substance(s) that would raise environmental and safety concerns. The photoresist stripping composition is an emulsion composition containing an aqueous phase and an organic solvent phase and comprising a surfactant and an ionic compound comprising a hydroxide ion. |
| priorityDate | 2019-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.