abstract |
The present invention provides a resin composition for stereolithography, said resin composition being easily shaped by means of stereolithography, while being excellent in terms of strain recovery, toughness and water resistance of a cured product thereof. The present invention relates to a resin composition for stereolithography, said resin composition containing (A) a polymerizable compound, a homopolymer of which has a glass transition temperature (Tg) of 37°C or higher, and (B) a photopolymerization initiator, while having a tanδ of 0.3 or less at 37°C after curing. |