| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b62a061db267544224c10495ee0cd640 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F257-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F257-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L51-003 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-36 |
| filingDate |
2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_941710cd6aa1f3041c855c7f9433eb61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2860e3d913361048e58d60fefcec41b2 |
| publicationDate |
2021-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2021065982-A1 |
| titleOfInvention |
Crosslinked polymer for resist |
| abstract |
[Problem] To provide a crosslinked polymer for high-sensitivity lithography. [Solution] This crosslinked polymer for resists, which changes in solubility in developing solutions by the action of an acid, contains phenolic hydroxyl groups, at least some of which have a structure formed by protection with a group represented by formula (1) (wherein R1 represents an alkyl group having 1-5 carbon atoms, n is an integer of 1-5, and * indicates the site of bonding to the residue formed by removing the hydrogen atom from the phenolic hydroxyl group) and at least some of which have been protected with a group represented by formula (2) (wherein R2 represents either a divalent saturated hydrocarbon group having 2-17 carbon atoms and optionally including an aliphatic cyclic group or a divalent hydrocarbon group having 6-17 carbon atoms and including an aromatic ring and * indicates the site of bonding to the residue formed by removing the hydrogen atom from the phenolic hydroxyl group) to make the polymer have a structure in which polymer chains have been crosslinked to one another. |
| priorityDate |
2019-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |