| abstract |
Provided are: a radiation-sensitive resin composition having excellent performance in terms of sensitivity, LWR, etc., in an exposure step even when a next-generation exposure technique is applied; and a method for forming a resist pattern using the composition.　This radiation-sensitive resin composition contains: a sulfonium salt compound represented by formula (1); a resin including a structural unit having an acid-dissociable group; and a solvent. (In the formula, Rf1 and Rf2 are each independently an electron-attracting group, and R1 and R2 are each independently an organic group, a hydroxyl group, etc.) |