http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020237736-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac31afbea1cbbb03498644721ffb4a62 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-0061 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 |
| filingDate | 2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a5093afab9343fc925d75dc50e8d4a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4682b6632d09fe6c838adf478c5ddd65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2c0f9522b45f39f204f9783e4f695e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af22d7761434c1d25521da67ccc5e626 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cef7ac62cbbe49af1855c103a6fcc37 |
| publicationDate | 2020-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020237736-A1 |
| titleOfInvention | Method for manufacturing nanostructure |
| abstract | The present application relates to the field of nanotechnology, and in particular to a method for manufacturing a nanostructure. The method comprises: according to a pre-set first pattern template, writing charges on a substrate having low surface energy, so that the substrate is chemically modified in a region where the charges are written, so as to form a first nanopattern; and introducing first nanoparticles in a region where the first nanopattern is located, so as to form a first nanostructure. The substrate itself has low surface energy, and by writing charges, the first nanopattern enables the surface of the substrate to be chemically modified. Therefore, the first nanopattern having high surface energy can be formed on the substrate. Therefore, the first nanoparticles can be precisely adsorbed in the region, where the first nanopattern is located, under the action of high surface energy, while the region, other than the first nanopattern, on the substrate has low surface energy and thus cannot adsorb the first nanoparticles, and the problem of non-specific adsorption in the prior is prevented from occurring, thereby allowing the formed first nanostructure to be cleaner. |
| priorityDate | 2019-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.