| abstract |
Tertiary amine and quaternary ammonium compounds of Formula I and/or Formula II are provided. The present technology also provides compositions that include one or more of the compounds that may be useful for electronics processing (e.g., semiconductor processing composition), cleaning, stripping, degreasing, or a combination of two or more thereof. The compounds of Formula I and/or Formula II may be useful as a low toxicity substitute for tetramethylammonium hydroxide. |