http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020212346-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8401bd1a86a10d5508942a53475fc38
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-562
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-56
filingDate 2020-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd314d3f053c3a3b1d2380c67cd24009
publicationDate 2020-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2020212346-A1
titleOfInvention Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or semi-bright nickel alloy coating
abstract The present invention is related to a galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or semi-bright nickel alloy coating characterized in that the electroplating bath comprises at least one compound having the general formula (I) and/or a salt thereof (I) wherein R1 = C1 – C18 hydrocarbon moiety comprising a SO3- group, or C1 – C18 hydrocarbon moiety comprising a carboxylic group, or C1 – C18 hydrocarbon moiety comprising an aromatic and/or a heteroaromatic group; R2 = NR3R4 moiety, or OR5 moiety, or cyclic NR6 moiety, wherein R3, R4, R5 = hydrogen, or C1 – C18 aliphatic hydrocarbon moiety, or C1 – C18 hydro- carbon moiety comprising an aromatic and/or a heteroaromatic group, wherein R3, R4 and R5 are identical or different; R6 = C3 – C8 hydrocarbon moiety, or C3 – C8 hydrocarbon moiety wherein at least one carbon atom is substituted by a heteroatom; n = 1 – 3; and wherein the electroplating bath further comprises at least one acetylenic compound at a total concentration ranging from 0.002 g/l to 0.15 g/l and/or a salt thereof, wherein the at least one acetylenic compound and/or a salt thereof is selected from the group consisting of H–C≡C–CH2–N(ethyl)2, H–C≡C–CH2–O–CH2–CH2–OH, CH3–CH(OH)–C≡C–CH(OH)–CH3, CH3–C(CH3)(OH)–C≡C–C(CH3)(OH)–CH3, HO–CH2–C≡C–CH2–OH, HO–CH2–CH2–O–CH2–C≡C–CH2–O–CH2–CH2–OH, H– C≡C–CH2–O–CH2–CH2–CH2–OH, and HO–CH2–C≡C–CH2–O–CH2–CH2–CH2– OH, and wherein the electroplating bath comprises chloral hydrate, wherein the chloral hydrate has a concentration of less than 0.07 g/l.
priorityDate 2019-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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