Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26c475bcbe0c24b485b6f37c45cd921f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2cda224139dcad5eb4bd9ea3a480fbde |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-502 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y70-00 |
filingDate |
2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_980e23efc665a1b924cfb9ef75c276fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db0dde36a6baa8dd3ccb3c26f6129b15 |
publicationDate |
2020-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2020191690-A1 |
titleOfInvention |
Photo-curable compositions for additive manufacturing |
abstract |
A photo-curable composition for use in additive manufacturing is presented. Said composition comprising: a) at least one epoxidized polyolefin which is characterized by a residual olefinic unsaturation of from 0.01 to 0.5 meq/g polymer and which is selected from the group consisting of epoxidized alicyclic polyolefin and epoxidized aliphatic polyolefin; optionally b) at least one epoxide compound which is distinct from the epoxidized polyolefin (a); c) at least one compound which has at least two reactive mercapto-groups per molecule; d) at least one free radical photoinitiator compound; and, e) at least one polyamine having at least two amine hydrogens reactive toward epoxide groups. |
priorityDate |
2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |