http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020181410-A1

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filingDate 2019-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4a7bf3a65bf39c81291c6674b30e0ee
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publicationDate 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2020181410-A1
titleOfInvention 1t1r resistive random access memory and manufacturing method therefor, transistor and device
abstract The present application provides a 1T1R resistive random access memory and a manufacturing method therefor, and a device. The 1T1R resistive random access memory comprises: a storage unit array constituted by a plurality of 1T1R resistive storage units, each 1T1R resistive storage unit comprising a transistor and a resistance switching device (30); the transistor comprising a channel layer (201), a gate layer (204) insulated from the channel layer (201), and a drain layer (203) and a source layer (202) provided on the channel layer (201), the drain layer (203) and the source layer (202) being longitudinally distributed on the channel layer (201); the resistance switching device (30) being provided close to the drain layer (203). The present application reduces the area of a transistor, so that the storage density of resistive random access memories is significantly increased, thereby solving the problem that the storage density of existing 1T1R resistive random access memories is limited due to the fact that the area of a transistor cannot be reduced.
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