| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2020-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fe00bda5326df81a8bf733effcea346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_265e4f241beca2fdd2dc5033823f6fda
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8ea0c38b372a9e80b3c288266172b3e |
| publicationDate |
2020-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020175427-A1 |
| titleOfInvention |
Semiconductor device production method, substrate processing device, and program |
| abstract |
The present invention provides technology for improving the uniformity of the thickness of a metal oxide film formed upon a substrate.　Provided is technology comprising: (a) a step for supplying a metal-containing gas to a substrate in a processing chamber; and (b) a step for supplying an oxygen-containing gas to the substrate in the processing chamber, with the speed of the flow of the oxygen-containing gas being 7.0 m/s to 8.5 m/s, and the partial pressure of the oxygen-containing gas being 9.0 Pa to 12.0 Pa. |
| priorityDate |
2019-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |