| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2020-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64643464c064e73d5eb5c1105c8bb26f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d61ed0fb5e29dd6b0ade95eedc532dc6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c5209fd80e4aa38b506db947d973137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a6340b2d48c7f6075ab2e89f3b8dc57 |
| publicationDate |
2020-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020153278-A1 |
| titleOfInvention |
Protective film-forming composition having acetal structure and amide structure |
| abstract |
Provided are: a composition for forming a protective film having excellent resistance to a wet etching solution for semiconductors during a lithographic process in the manufacture of semiconductors; a method of forming a resist pattern using said protective film; and a method for manufacturing a semiconductor device. This composition for forming a protective film against a wet etching solution for semiconductors comprises: a compound or polymer which contains at least one among an acetal structure and an amide structure; and a solvent. The polymer is preferably a copolymer of: a compound (a) containing at least one acetal structure in a molecule; and a compound (b) containing at least one amide structure in a molecule. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023162780-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023085293-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022054853-A1 |
| priorityDate |
2019-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |