| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8887
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8864
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8854 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06N3-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06N3-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06N3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06N3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 |
| filingDate |
2020-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ae98185acf29439a7b71036189e44a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eae096318a603d460f40e46b8725ab8f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23355b3a13c0bcaad7ac0875eb3e2c17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1678de4beb996dcd72f40ad569624a92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d11fb7bc639553fdebd8320075a71460 |
| publicationDate |
2020-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020146708-A1 |
| titleOfInvention |
Defect classification and source analysis for semiconductor equipment |
| abstract |
Defects on a substrate comprising electronic components can be classified with a computational defect analysis system that may be implemented in multiple stages. For example, a first stage classification engine may process metrology data to produce an initial classification of defects. A second stage classification engine may use the initial classification, along with manufacturing information and/or prior defect knowledge to output probabilities that the defects are caused by one or more potential sources. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023278989-A1 |
| priorityDate |
2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |