http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020121967-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2019-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22939ca1d99a334e2e5b72455960fcb4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_faba893318dcdb0cd5f1a3961c35ae8c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f70b20df424de8bcab2cefba48220d64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d04851b6d5bd7c7afe92b254f633b84 |
| publicationDate | 2020-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020121967-A1 |
| titleOfInvention | Photosensitive resin composition, method for producing resist pattern film, and method for producing shaped plating structure |
| abstract | A photosensitive resin composition containing a polymer (A) having an acid labile group, a photoacid generator (B), and at least one type of compound (C) selected from among the compound (C1) indicated in formula (C1), the compound (C2) indicated in formula (C2), and a polymer of the compound (C2). [The Z in formula (C1) and Z in formula (C2) each represent independently an oxygen atom or a sulfur atom. In formula (C1), each R 31 represents independently a monovalent hydrocarbon group or a group wherein at least one hydrogen atom in the monovalent hydrocarbon group has been replaced by a mercapto group, and p represents an integer of 1 or greater. However, in formula (C1), when p is 1, and when p is an integer of 2 or greater and all the Z symbols represent oxygen atoms, at least one of the R 31 groups is the group wherein at least one hydrogen atom in the monovalent hydrocarbon group has been replaced with the mercapto group. In formula (C2), R 32 and R 33 each independently represent a divalent hydrocarbon group, R 34 represents a glycoluril ring structure or an isocyanuric ring structure, m represents 1 or 0, and q represents an integer from 1 to 4.] |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023162552-A1 |
| priorityDate | 2018-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 216.