Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ab054d4fd1810c2c2350c52d00de0add |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-883 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-8833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11C13-0069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11C13-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-011 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B63-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11C13-0097 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-826 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L45-00 |
filingDate |
2019-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed30da29cf82980ab0f6fff9744d8f45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3846f9578f87e3c6ad10b6cb2d938bfb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b4aa46b07dec908f6d95702b30ccbce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_786d6dbca6db4d97cd9686e777d7b58a |
publicationDate |
2020-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2020109753-A1 |
titleOfInvention |
Fabrication of correlated electron material (cem) devices |
abstract |
Subject matter disclosed herein relates to fabrication of a correlated electron material (CEM) switch (302). In particular embodiments a method include forming a structure (160, 170, 180) on a first portion of a substrate (262) while maintaining a second portion of the substrate exposed. A sealing layer (285) is deposited over the structure and over at least a portion of the exposed second portion of the substrate (262). A conductive via (365) is formed e.g. by way of a dry etch through the sealing layer (285) to contact an exposed metal layer (250). In embodiments, an etch-stop control layer is utilized to control an etching process prior to formation of metal contacts over the CEM switch and the conductive via. |
priorityDate |
2018-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |