| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2019-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67787db023e7ebef6a9f218cc2e76d4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_878ada85d343014ab0699c2d17a36bfe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a70f00f3f7ed2769af7d0749d67922c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31f4f2ba679d44df6020e0a7fab628c0 |
| publicationDate |
2020-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020071361-A1 |
| titleOfInvention |
Resist underlayer film forming composition and method for forming resist pattern using same |
| abstract |
The present invention provides: a composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for forming a resist pattern, which uses this resist underlayer film forming composition. A resist underlayer film forming composition which contains an organic solvent and a polymer that has a structure represented by formula (1) or (2) at an end of the polymer chain. (In formula (1) and formula (2), X represents a divalent organic group; A represents an aryl group having 6-40 carbon atoms; R1 represents a halogen atom, an alkyl group having 1-40 carbon atoms or an alkoxy group having 1-40 carbon atoms; each of R2 and R3 independently represents a hydrogen atom, an optionally substituted alkyl group having 1-10 carbon atoms, an aryl group having 6-40 carbon atoms or a halogen atom; each of n1 and n3 independently represents an integer of 1-12; and n2 represents an integer of 0-11.) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020209327-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022196662-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022025090-A1 |
| priorityDate |
2018-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |