| abstract |
Provided are: an OLED-use metal mask material in which the amount of warping caused by etching is reduced; a method for producing same; and a metal mask. This metal mask material and this metal mask are characterized by containing 35.0-37.0% of Ni and 0.00-0.50% of Co in terms of mass%, with the remainder comprising Fe and impurities, and are characterized in that when a square metal mask material sample measuring 100 mm on each side and having a sheet thickness of 5.00-50.00 μm is etched from one side until the sheet thickness becomes 2/5 the original sheet thickness, and when the etched sample is then mounted on a surface plate, the amount of warping, which is the maximum value among the uplift amounts of the four corners of the sample, is 5.0 mm or less. |