| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-011 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D143-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D135-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F122-1006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2019-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a111168c8b618bd6b9b78cceed8289
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8272deb5e23611a18f14c61b444c2d0 |
| publicationDate |
2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020066982-A1 |
| titleOfInvention |
Underlayer film-forming composition for imprinting, method for producing underlayer film-forming composition for imprinting, method for producing pattern, method for producing semiconductor, cured article and kit |
| abstract |
Provided is an underlayer film-forming composition for imprinting which contains a curable component and a particulate metal which includes one or more types of iron, copper, titanium and lead and exhibits a particle diameter of at least 10nm when measured according to the single particle ICP-MASS method, wherein the particulate metal content is 50 mass ppt to 10 mass ppb of the composition. Further provided are a method for producing the underlayer film-forming composition for imprinting, a method for producing a pattern, a method for producing a semiconductor, a cured article and a kit. |
| priorityDate |
2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |