| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2019-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a0acc6b510ca764de19434633b49404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62e2892b2a05b9e1f66c57d72e144851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52952b8c410fab9bc4b7afccd4de94f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ee0e7ae3c8a0a5115e1d805c445c1a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e2cf846501de5191624a40418c03b36 |
| publicationDate |
2020-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020054275-A1 |
| titleOfInvention |
Actinic light sensitive or radiation sensitive resin composition, resist film, pattern forming method, and method for producing electronic device |
| abstract |
Provided is an actinic light sensitive or radiation sensitive resin composition that has excellent resolution and that enables the formation of a pattern having excellent LWR. Also provided are a resist film, a pattern forming method, and a method for producing an electronic device. This actinic light sensitive or radiation sensitive resin composition contains a resin and a photoacid generator. The resin contains a repeating unit containing a partial structure represented by formula (2) and at least one repeating unit selected from the group consisting of a repeating unit containing a group having a polarity that is increased by the action of an acid, a repeating unit represented by general formula (1-1), and a repeating unit represented by formula (1-2). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7134066-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023054127-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021251055-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102492349-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020071466-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200050870-A |
| priorityDate |
2018-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |