http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020051939-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d37147a1eebc1b4c794a203b6f0da7e5 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133514 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2018-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15bebd57a2a54ec6bb52b25a7f782f0b |
| publicationDate | 2020-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020051939-A1 |
| titleOfInvention | Photoresist composition and color filter |
| abstract | A photoresist composition and a color filter. The photoresist composition comprises: 4 to 10 parts by weight of a resin matrix; 5 to 8 parts by weight of a coloring agent; greater than 0 and less than or equal to 5 parts by weight of a radical polymerization monomer; greater than 0 and less than or equal to 0.2 part by weight of a radical photoinitiator; greater than 0 and less than or equal to 0.002 part by weight of a cationic photoinitiator, the maximum absorption wavelength of the cationic photoinitiator being between 280 and 400 nanometers; and 70 to 80 parts by weight of a solvent. The photoresist composition is not affected by an active oxygen atom, can improve the adhesion between the photoresist composition and a substrate, and is suitable for a color photoresist composition having the high color gamut or the high color density. |
| priorityDate | 2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.