http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020042223-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d37147a1eebc1b4c794a203b6f0da7e5 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 |
| filingDate | 2018-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a729d3cb16f6daef0d79788ca0685d7a |
| publicationDate | 2020-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020042223-A1 |
| titleOfInvention | Etching solution composition for copper/molybdenum film layer |
| abstract | An etching solution composition for a copper/molybdenum film layer, comprising a homogeneous mixture of an oxidizing agent, an organic acid, an etching regulator, an inorganic salt, a chelating agent, an etching inhibitor, and a solvent. Relative to the total mass of the composition, the oxidizing agent has a mass fraction of 5% to 15%, the organic acid has a mass fraction of 4% to 13%, the etching regulator has a mass fraction of 0.1% to 5%, the inorganic salt has a mass fraction of 0.1% to 5%, the chelating agent has a mass fraction of 0.5% to 9%, the etching inhibitor has a mass fraction of 0.001% to 1%, and the remaining is the solvent. |
| priorityDate | 2018-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 98.