http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020039784-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2019-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8db8a686f8ba663df0b117b048671b94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_783e8a52cc3cfd7e21a670f17beadb00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_229ff91a47110f02c680e08c99e429d7 |
| publicationDate | 2020-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020039784-A1 |
| titleOfInvention | Substrate processing device, process liquid, and substrate processing method |
| abstract | This substrate processing device (1) is provided with a substrate holding unit (2), a process liquid supply unit, a heating unit (5), and a liquid removal unit. The substrate holding unit (2) holds a substrate (9) in a horizontal state. The process liquid supply unit supplies a process liquid having a higher surface tension than IPA on an upper surface (91) of the substrate (9), thereby forming a liquid film of the process liquid covering over the entire surface of the upper surface (91) of the substrate (9). The heating unit (5) heats the substrate (9) from the lower surface (92) side to vaporize a part of the liquid film, thereby forming a gas-phase layer between the upper surface (91) of the substrate (9) and the liquid film. The liquid removal unit removes the liquid film on the gas-phase layer. This makes it possible to suppress unintended damage to the liquid film. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230124487-A |
| priorityDate | 2018-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.