http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020017763-A1

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filingDate 2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f84d4aef148f285bccebb5f36286030
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4983192a820e109cd48835c384e191b1
publicationDate 2020-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2020017763-A1
titleOfInvention Focus ring, manufacturing method thereof, and substrate processing apparatus
abstract A focus ring according to an aspect of the present invention comprises a ring-shaped body having an empty inside so as to be mounted while enclosing a processing substrate in a substrate processing apparatus for performing plasma processing, wherein the body is formed by processing an ingot made of polycrystalline silicon carbide (SiC) material manufactured by a physical vapor transport (PVT) method.
priorityDate 2018-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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