http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020012240-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_199ec68c525f06eca7b1267f1b715cb0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02W10-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-346 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F3-341 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F103-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F3-34 |
| filingDate | 2018-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8fc6997cf2be15527b4fdd8f8eed9e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbf14ce976f7b357a43f17da18ac251d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b65133c61e9b10fb5fa56680f5b72f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2a3e4efc0693772514d71ff5b2d4a4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2db7766091f0a49a41a2240db068899 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b760cea0a25aaa48ef7b1a10cbae48e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b93756e3161565cc2055bd2d5c67e11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cdc189a8965eb6d1a2ae1a47cc01199 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb6536a22bbe7adf8484f109270a4048 |
| publicationDate | 2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020012240-A1 |
| titleOfInvention | Process and plant for the treatment of a wastewater containing tmah |
| abstract | The present invention describes an innovative process and corresponding plant for the treatment of waste solutions produced by the semiconductor electronics industry. In particular the main object is removal of the TMAH (tetramethyl ammonium hydroxide) molecules and photoresist (mixture of organic solvents) so as to render the solutions more readily treatable in a conventional biological plant, and to avoid disposal of such wastes externally with an obvious increase in management costs. The process provides for three separate treatment lines, each of which processes a specific waste solution: LINE 1 which treats the TMAH solution mixed with that containing the photoresist; LINE 2 which treats another waste containing fluorides, phosphates, ammonia and nitrates; LINE 3 which instead treats a solution characterised by high concentrations of fluorides, nitrates, acetic acid and COD. At the end of the corresponding processes the three solutions are pooled and stored in a common tank, from which a standard activated sludge plant which performs final removal of the ammonia and nitrates is fed. The present invention is therefore included in the group of technologies for the treatment of industrial waste solutions, filling an obvious technological gap in the electronics industry; in fact at the present time the discharge concentration of TMAH, which is approximately 10 mg/L, appears to be too high, while with the present invention values of 0.5 mg/L are obtained, with an obvious improvement in environmental performance and a reduction in external disposal costs. |
| priorityDate | 2018-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 62.