| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcdab27b778da1d6b6420d581d0c2fe |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07B2200-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2296
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2284
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ba4f2302109b2a8f3a84584e17f97d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7567c928eee5b620f63a608e68724ce7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcfed4dc8927b931c291bd876824ab4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e15fcb3153779fa12b4dcf41dc462d7c |
| publicationDate |
2019-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019199467-A1 |
| titleOfInvention |
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| abstract |
A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR')3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR'2)3 and no more than 4 mole% dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R' is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn-(NR'COR")3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R' and R" are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210128796-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102538092-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210128795-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102577300-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102586112-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11697660-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022242888-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11459656-B1 |
| priorityDate |
2018-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |