| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4488 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2019-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58dd4cdff773e21b76cfca013521be26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_677a21db4f7f686498c3a92f526d4be0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c24cafa304baf818473b71f1490aec32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f69568ba64319ebf5f78b5af8f9df8d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_844e1e7404ca07f85529de324d98257f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71433337fffc76a7c5fd06712e09d6a6 |
| publicationDate |
2019-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019191310-A1 |
| titleOfInvention |
Low temperature in-situ cleaning method for epi-chamber |
| abstract |
Embodiments of the disclosure may provide a method and apparatus for cleaning an epi-chamber at a low temperature so that residues are quickly eliminated from a surface of the epi-chamber after a performing a low temperature epitaxial deposition process. Some of the benefits of the present disclosure include flowing a chlorine containing gas to an improved epi-chamber having UV capability to chlorinate and quickly remove the epitaxial deposition residues at a low cleaning process temperature. As such, residues are decreased or removed from the epi-chamber such that further processing may be performed. |
| priorityDate |
2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |