| abstract |
The present invention is characterized by: having, as the main phase thereof, an oxide including Al, Si, and Zn as the metal components thereof; containing 0.5–20 at.% nitrogen; and having the nitrogen present as a nitride. Ideally, the indentation hardness of the oxide film is 700–1,500 kgf/mm 2 . In addition, when a bending test is conducted at a film thickness of 50 nm, the reduction in water vapor transmittance after the bending test is ideally no more than 30% and the reduction in visible light transmittance no more than 5%. |