http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019142487-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6900162c0a64e321929e285aef793d73 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-48 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-48 |
| filingDate | 2018-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f19a661944bf6b6264420fb31949fa8 |
| publicationDate | 2019-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2019142487-A1 |
| titleOfInvention | Method for producing plated structure |
| abstract | [Problem] To make it possible to easily form, with use of a trivalent chromium plating liquid, a chromium plating layer and a chromium oxide layer which is on the chromium plating layer and has a film thickness of 20 nm or more, which exhibiting high corrosion resistance. [Solution] After the formation of a chromium plating layer by performing an electrolytic treatment at a current density of 3 A/dm2 or more with use of a trivalent chromium plating liquid, a chromium oxide layer that has a film thickness of 20 nm or more is formed on the surface of the chromium plating layer by performing an electrolytic treatment at a decreased current density of 0.05-2.5 A/dm2 with use of a trivalent chromium plating liquid. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022123023-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022123008-A3 |
| priorityDate | 2018-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.