Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-82345 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L25-0657 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-845 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0886 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823462 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0688 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823437 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-8221 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
filingDate |
2017-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c5781b889dd3e3508c3f78ba007ce5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e2175c9219bbc793c8dde3f525f64c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec7376224d52dfada9b48b86f6b0d264 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e980122b0937ebb79125f5638c94801 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1fa1c8944ead4b5c138f4ae88411558 |
publicationDate |
2019-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2019132893-A1 |
titleOfInvention |
Integrated circuits with stacked transistors and methods of manufacturing the same using processes which fabricate lower gate structures following completion of portions of an upper transistor |
abstract |
Integrated circuits with stacked transistors and methods of manufacturing the same are disclosed. An example integrated circuit includes a first transistor in a first portion of the integrated circuit, and a second transistor stacked above the first transistor and in a second portion of the integrated circuit above the first portion. The integrated circuit further includes a bonding layer between the first and second vertical portions of the integrated circuit. The bonding layer includes an opening extending therethrough between the first and second vertical portions of the integrated circuit. The integrated circuit also includes a gate dielectric on an inner wall of the opening. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11362096-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102020110792-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102020110792-A1 |
priorityDate |
2017-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |