http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019124269-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b657bae7c6ba14f228fefd2393ecc834 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-87 |
| filingDate | 2018-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fee8079596dec85e8deaf370562d07ee |
| publicationDate | 2019-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2019124269-A1 |
| titleOfInvention | Article equipped with functional layer and method for manufacturing article equipped with functional layer |
| abstract | Provided is an article equipped with a functional layer, in which the decrease in performance of the functional layer over time is minimized, whereby an excellent durability is obtained. An article equipped with a functional layer, having a substrate and a functional layer laminated on the substrate, wherein: the functional layer comprises an intermediate layer containing silicon oxide and aluminum oxide, and a surface layer, which is directly laminated on the intermediate layer and which is formed using an organic compound having a group capable of reacting with silicon oxide and aluminum oxide; and when the depth point, from among the depth points of a depth-direction profile acquired by X-ray photoelectron spectroscopy in the functional layer, at which the proportion of C atoms relative to the total number of C, O, Al, and Si atoms first reaches 5 atom% is deemed to be the origin, the average value of the proportion of Al atoms relative to the total number of Si and Al atoms in a region of 1.0 to 3.0 nm in the depth direction from the origin is 55 to 98 atom%. |
| priorityDate | 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.