| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b2bed4b4d247d7fe14cfd9610d22c463 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24592 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3464
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0625 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 |
| filingDate |
2018-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa32b207ca0848e9db962904be750f84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7934603aaafbc08fd2f840d0b32c9a9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be2bc0ff144ea3be7115ea0d1e2c615d |
| publicationDate |
2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019110948-A1 |
| titleOfInvention |
Method and device for automatically determining values of adjustments to operating parameters of a deposition line |
| abstract |
The determining method according to the invention comprises: — obtaining (E10) a mathematical model relating at least one operating parameter of the deposition line to at least one quality function defined on the basis of at least one quality measurement characterising the quality of a stack of thin layers deposited by the deposition line on a transparent substrate; — obtaining (E50) a value of said at least one quality function from a value of said at least one quality measurement measured at the end of the deposition line on a stack of thin layers deposited by the deposition line on a substrate with the deposition line parameterised with a so-called current value of said at least one operating parameter; and — automatically determining (E80) by means of the mathematical model a value of an adjustment of the current value of said at least one operating parameter allowing a discrepancy existing between the obtained value of said at least one quality function and a target value chosen for said at least one quality function for the stack of thin layers to be decreased. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022180085-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022023029-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021239516-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-4105746-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022263586-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3120125-A1 |
| priorityDate |
2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |