| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2018-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9599027b1a642963a92c0e2db240b6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e2dbf04961837c21507f9a92f3ee33a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e82d19c7fe263e92df99113f575926b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3140a7aced92bc10cc0ca7f48c85b893 |
| publicationDate |
2019-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019110681-A1 |
| titleOfInvention |
Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process |
| abstract |
A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022135915-A1 |
| priorityDate |
2017-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |