| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F15-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4481
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4402 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2018-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d04be56a9d142d17374c31321a508079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0094243bcd65b5a69b0e88dd1c2a8973
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01e80ea8e48fe94868e3b6040617f6ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c831012e04718c6061bda227998fc2a |
| publicationDate |
2019-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019083628-A1 |
| titleOfInvention |
DISTRIBUTION OF CHEMICALS WITH LOW STEAM PRESSURE |
| abstract |
The invention relates to a method and a device for supplying gas to a semiconductor processing system. In some embodiments, the apparatus includes a gas supply line having an inlet valve; a gas outlet pipe having an outlet valve; a gas flow control device adapted to control flow through the inlet valve; an orifice contained within at least one of the gas outlet line, the outlet valve, a chemical ampoule outlet valve or an outlet isolation valve; a chemical ampoule fluidly coupled to at least one of the gas supply line and the gas outlet line; and a treatment chamber. In some embodiments, the apparatus further comprises a non-return valve, one or more orifices and / or a heated deflection line. |
| priorityDate |
2017-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |