| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2018-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7bc6852c8a3777d80bfd006e6166315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aedee7414180fb2af1605aa79345b279
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1058fc25b4afc625170f0e9a240975b |
| publicationDate |
2019-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019077924-A1 |
| titleOfInvention |
Method of manufacturing circuit board and method of manufacturing touch panel |
| abstract |
The present invention relates to a method of manufacturing a printed circuit board and a method of manufacturing a touch screen, each of them successively comprising: a step of forming a positive photosensitive composition layer on a conductive layer; a step of subjecting the layer of positive photosensitive composition to pattern exposure; a step of developing the positive photosensitive composition layer exposed to the pattern; a step of etching the conductive layer by employing the layer of positive photosensitive composition developed as a mask; a step of subjecting the layer of the developed positive photosensitive composition to a full surface exposure; and a step of removing the layer of positive photosensitive composition having undergone full surface exposure. |
| priorityDate |
2017-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |