http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019074977-A1

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filingDate 2018-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46aa9fbaf66becccfc6c988cbc435779
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publicationDate 2019-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019074977-A1
titleOfInvention METHOD FOR MANUFACTURING NANOMETRIC SUBMICRON SPACING ELECTRODES / WAFER SCALE AND PHOTOLITHOGRAPHIC NETWORKS
abstract The invention relates to an electronic device and a manufacturing method. The electronic device (208) includes a first electrode and a second electrode. A nanospace is formed between first and second electrodes. The first electrode, the second electrode and the gap may be located in the same layer of the device. A two-dimensional layer of graphene can cover the space.
priorityDate 2017-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.