| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6875
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4581
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H02N13-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H02N13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2018-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60fff14ef82dcc2e61b15e594b76db8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5efa50fa64afe731f2e70c322bd86847
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4117126262ce5b9c245f0f4b85c7f905
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef85599b618decba348366fbd2dbeeab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b665f28a5f50b4e79c6da7cfd1f27fa1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d47edbe719c2ecc69bcdc8f8ab4c06f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67708c9f606264c7c9fd018c9280061a |
| publicationDate |
2019-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019074843-A1 |
| titleOfInvention |
ELECTROSTATIC CHUCK FOR SUBSTRATE TREATMENT WITHOUT DAMAGE |
| abstract |
In some embodiments, the invention provides an improved electrostatic chuck for use in a processing chamber for manufacturing semiconductor devices. According to one embodiment, a treatment chamber comprises a chamber body having a treatment volume defined therein and an electrostatic mandrel disposed within the treatment volume. The electrostatic chuck includes a support surface having a plurality of mesas thereon, one or more electrodes disposed within the electrostatic chuck, and a stabilization layer deposited on the support surface on the plurality of mesas. The support surface is made of a material containing aluminum. The electrode or electrodes are adapted to form electrostatic charges for electrostatically attaching a substrate to the support surface. The stabilization layer is configured to provide a damping support to the substrate when the substrate is electrostatically attached to the support surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022024906-A1 |
| priorityDate |
2017-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |