| abstract |
The invention relates to lithographic apparatuses suitable for, and methodologies relating to, electron beam lithography such as complementary electron beam lithography (CEBL). In one example, a method of producing an electron beam lithography is to form a universal background grid of exposures to a sub-resolution assisted electron beam. The method also includes forming a plurality of features along the universal sub-resolution electron beam exposure array. The plurality of features is formed by performing resolution exposures at discrete locations along the sub-resolution assistance electron beam exposure array. |