| abstract |
The present invention relates to a resist composition containing a resin component (A1), the solubility of which in a developing solution can vary according to the action of an acid, the resin component (A1) comprising a constituent unit (a0) represented by the general formula (a0-1) (in the formula, Ya 01 and Ya 02 independently represent a single bond or an alkylene group having 1 to 3 carbon atoms, the total number of carbon atoms in Ya 01 and d carbon atoms in Ya 02 being less than or equal to 3, Ra 01 and Ra 02 independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, the total number of carbon atoms in Ra 01 and carbon atoms in Ra 02 being in the range of 2 to 6 inclusive, and A 'is an alkylene group having 1 to 5 carbon atoms). |