Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08 |
filingDate |
2018-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1150d10f7440a595a7aae164fbb0842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a1a85d8f97bb386aa64c4524c12fad |
publicationDate |
2019-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2019054625-A1 |
titleOfInvention |
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM COMPRISING SAME |
abstract |
The present invention relates to a photosensitive resin composition containing a poly (imide-benzoxazine) block copolymer, and a cured film. The poly (imide-benzoxazine) block copolymer contained in the photosensitive resin composition of the present invention permits the formation of a cured film having excellent mechanical and insulating properties, including at a low temperature below 200 ° C. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11215928-B2 |
priorityDate |
2017-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |