| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f143a79ecdd1c20966ba5896d5342930
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f518f3a8073a77490a1d6274cbaa1546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f7b36180e30ab3bb48ddac4cd4e029 |
| publicationDate |
2019-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019050120-A1 |
| titleOfInvention |
Chemical amplification type positive type photoresist composition for photoacid generators and thick films containing them |
| abstract |
The present invention relates to a photoacid generator and a chemically amplified positive photosensitive resin composition for a thick film comprising the same. The photoacid generator is chemically and thermally stable and can exhibit high sensitivity while also having a high solubility with respect to a solvent of a photosensitive resin composition. In particular, the photoacid generator is decomposed by light so as to generate an acid and, simultaneously, may exhibit an anti-corrosion effect on a metal substrate. |
| priorityDate |
2017-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |