| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3602
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B15-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B15-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B15-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 |
| filingDate |
2018-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_231bbe1b445d8cc677254d3b1f0290ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45f14a1f5a5f84d2b5cad1fec34959e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b84f95b095e5de168cb8565d26eb0d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a73f8651c8fdfa38622cf3cb118870 |
| publicationDate |
2019-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019049919-A1 |
| titleOfInvention |
Photomask blanks, photomask, exposure method, and device manufacturing method |
| abstract |
The invention relates to a photomask plate which comprises: a substrate; and at least a first layer and a second layer, which are successively placed from the substrate side. The first layer contains chromium; the second layer contains chromium and oxygen; and the surface of the second layer has an arithmetic mean height of 0.245 nm or more. |
| priorityDate |
2017-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |