| abstract |
The problem described by the present invention is to provide an electrode film which is excellent in terms of invisibility of mesh pattern and image visibility, and its manufacturing method. The solution of the invention relates to a method of manufacturing an electrode film comprising: a step of sequentially stacking a metal layer and a layer of black photoresist on a first main surface of a transparent substrate ; a step of partially exposing, developing and forming patterns in a mesh shape of the black photoresist layer; a step of treating the metal layer with a metal mesh electrode with the black patterned photoresist layer as an etching mask, etching the metal layer until its width becomes smaller the width of thin lines constituting a mesh of the black photoresist layer; and a step of softening the black photoresist layer by heating, and thus covering not only the upper surface but also the two side surfaces of each of the fine lines constituting a mesh of the metal mesh electrode with a flap of the softened black photoresist. |