http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019041490-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_75b85b30eaa65e4dd97668ef24bf8bbd
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N10-855
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-22
filingDate 2017-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce020f7b71a1d22355d98762a5d4f068
publicationDate 2019-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019041490-A1
titleOfInvention Method for preparing GaN thermoelectric film material
abstract The invention relates to a method for manufacturing a GaN thermoelectric thin film material. The method utilizes a patterned sapphire substrate that undergoes H2 purification, low temperature buffered growth, heated cross sectional growth and pressure annealing to produce the GaN thin film material. The GaN thermoelectric thin film material thus manufactured has a high overall uniformity, a high breakdown voltage, an extended service life and improved application prospects.
priorityDate 2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011240082-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104091759-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527288
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5943
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559503
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90455
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449222878

Total number of triples: 20.