http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019040041-A1

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filingDate 2017-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2019-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019040041-A1
titleOfInvention NANOFIL SELF-ALIGNED
abstract The present invention relates to a method which comprises: forming a substrate; forming a first nanowire on the substrate; forming a second nanowire on the substrate; forming a grid on a portion of the first and second nanowires; implanting a dopant such that a region between the first and second nanowires under the gate does not receive the dopant while a region between the first and second nanowires opposite the gate receives the dopant, the doping amorphous material of the region between the first and second nanowires opposite the grid; and performing isotopic etching of the region between the first and second nanowires opposite the grid.
priorityDate 2017-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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