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filingDate 2017-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26e58568c4f42b1c8624d9bb1a09013d
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publicationDate 2019-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2019038892-A1
titleOfInvention Group 13 element nitride layer, free-standing substrate and functional element
abstract PROBLEM TO BE SOLVED: To reduce the dislocation density in a Group 13 element nitride crystal layer having top and bottom surfaces comprising a Group 13 element nitride crystal selected from gallium nitride, aluminum nitride, indium nitride or mixed crystals thereof, and the whole Provide a microstructure that can reduce variations in characteristics over the A linear high-intensity light emitting portion 5 and a low-intensity light emitting region 6 adjacent to the high-intensity light emitting portion 5 when the top surface 13a of a group 13 element nitride crystal layer 13 is observed by cathodoluminescence . It is characterized in that the half value width of (0002) plane reflection of the X-ray rocking curve on the upper surface 13a is 3000 seconds or less and 20 seconds or more.
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