| abstract |
Provided is a siloxane resin composition which is excellent in adhesiveness and fine pattern processability. Siloxane resin (A) containing a structure represented by the following general formula (1), a structure represented by the following general formula (2), and a structure represented by the following general formula (3), having an unsaturated double bond It is a siloxane resin composition containing a compound (B), a photoinitiator (C), and a solvent (D). (In the general formulas (1) to (3), R 1 , R 2 and R 3 each independently represent hydrogen, a hydroxy group, a group having a siloxane bond or a monovalent organic group having 1 to 30 carbon atoms. Represents an alkenyl group, an alkynyl group, a monovalent organic group having a nitrogen atom and a carbon-oxygen unsaturated bond, or a monovalent organic group having a cyclic ether bond, Y represents a photoradically polymerizable group (with the proviso that alkenyl is Z represents a monovalent organic group having an alkali-soluble group, a, b and c each independently represent an integer of 1 or more. When c is 2 or more, plural R 1 s , R 2 s , R 3 s , X, Y and Z may be the same or different.) |