| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_04960d3a0d0b9813ec3b6caafe9cd928 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2277-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2245-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2202-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2240-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N1-0476
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-0011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N1-44 |
| filingDate |
2018-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4870ac034cadc5ca19a0801f5a28ec31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b69edab0f70e41cf654a6df96d04c0cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_888f09c3bea81864f58f1b66d41a236e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b117a722702e27d773775854bf6c710
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_876055edc23d6e9bac59d176a7e967e4 |
| publicationDate |
2019-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019020569-A1 |
| titleOfInvention |
ELECTRODE ARRANGEMENT FOR DIELECTRICALLY INTERFERED PLASMA PROCESSING |
| abstract |
An electrode arrangement for dielectrically impeded plasma treatment of a surface of a body, provided with at least one flexible flat electrode (1) and a dielectric (2) of a first flexible material plate which protects the electrode (1) of the surface to be treated with a layer (3) preventing direct current flow. The dielectric (2) can rest by means of a structure (4) provided with shoulders (7) on the surface to be treated, air spaces (5) which have an open side towards the surface to be treated and a closure the bottom side through the layer (3) preventing a direct current flow of the dielectric (2) being formed between the shoulders (7) for the constitution of the plasma. The structure (4) comprises a plurality of distance elements (6) of a second material whose flexibility is less than the flexibility of the first material, and the shoulders (7) of the structure (4) are partially or completely made up of through the distance elements (6). |
| priorityDate |
2017-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |