| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 |
| filingDate |
2018-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d183d06cb5b63e7edd7b5e51ccf8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0a3cf43e2311281eafe792dd815c1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b195256245da8ede518217239c267604 |
| publicationDate |
2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019009001-A1 |
| titleOfInvention |
DEVICE MANUFACTURING METHOD |
| abstract |
Provided is a method of manufacturing a device capable of detecting noise-reduced light while enhancing sensitivity to a target light. The device manufacturing method forms a resist film pattern with a thickness of 5 μm or more on a support using a resist composition, and then performs ion implantation to the support using the resist film pattern as a mask to receive light. A process of manufacturing the element, a process of forming a layer of the composition for forming a pixel of the optical filter on at least a part of the light receiving element where the ion implantation is performed, and a layer of the composition for forming the pixel The process of irradiating with light with a wavelength of 300 nm or less and exposing it in a pattern, and the process of developing a layer of the composition for forming a pixel after exposure to form a pixel. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7051321-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7079581-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3948897-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019023671-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019045659-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021002902-A3 |
| priorityDate |
2017-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |