| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B2203-002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_983e04fd21f7236969e90b4c0113ad50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb1e4c6d48e70baab50fb5a65e27c7ff |
| publicationDate |
2018-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018193920-A1 |
| titleOfInvention |
Substrate processing method and substrate processing device |
| abstract |
A substrate processing method, including: a substrate holding step for holding a substrate that has a surface in which a metal is exposed; an inert gas substitution step for feeding an inert gas to the vicinity of the surface of the substrate and thereby substituting the atmosphere surrounding the surface of the substrate with an inert gas; an adjustment step for adjusting the pH of a rinsing liquid so as to form an inert state in which the metal does not react with the rinsing liquid, or so that the metal reacts with the rinsing liquid to form a passive state; and a rinsing liquid feeding step for feeding the pH-adjusted rinsing liquid to the surface of the substrate after the atmosphere surrounding the surface of the substrate has been substituted with the inert gas. |
| priorityDate |
2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |