| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b41b0648d0a03d2954be68236c3403da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0114627d932d3a123ce008f8ca37335d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d26202d366193a30f2471879d7ce63b9 |
| publicationDate |
2018-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018181989-A1 |
| titleOfInvention |
Composition for forming silicon-containing resist underlayer film having carbonyl structure |
| abstract |
[Problem] To provide a composition for forming a resist underlayer film, which enables removal of a mask residue after lithography without etching by means of a chemical liquid only.n[Solution] A composition for forming a silicon-containing resist underlayer film, which is characterized in that: the composition contains a polysiloxane that contains a unit structure containing a carbonyl group-containing functional group; and the silicon-containing resist underlayer film is used as a mask layer in a step wherein a pattern is transferred to an underlayer by a lithography process and the mask layer is subsequently removed by means of a chemical liquid that contains hydrogen peroxide. The composition for forming a silicon-containing resist underlayer film, wherein the unit structure containing a carbonyl group-containing functional group contains a cyclic acid anhydride group, a cyclic diester group or a diester group. The polysiloxane additionally contains a unit structure containing an amide group-containing organic group; and the amide group is a sulfonamide group or a diallyl isocyanurate group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I725712-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023074777-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022210901-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7307004-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230112660-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230003058-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11385544-B2 |
| priorityDate |
2017-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |