http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018180308-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate | 2018-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda610e3d51ab514daf7538f668089e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb0045d24003e2a9c6df126e51068ac8 |
| publicationDate | 2018-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2018180308-A1 |
| titleOfInvention | Chemically amplified resist material and method for forming resist pattern |
| abstract | The purpose of the present invention is to provide a resist material which can achieve both of high sensitivity and excellent lithographic properties at high levels in a pattern formation technique utilizing a radioactive ray having a wavelength of 250 nm or less, such as EUV, electron beam, ion beam, KrF excimer laser and ArF excimer laser. The present invention is a chemically amplified resist material which can be used as the photosensitive resin composition in a lithographic process involving a partial irradiation step, a whole area irradiation step, a heating step and a developing step, and which contains (1) a base component that can be made soluble or insoluble in the developing solution by the action of an acid and (2) a component that can generate a radiation-sensitive sensitizer and an acid upon the irradiation with a radioactive ray, wherein the component (2) contains components (a) and (b) as mentioned below, or components (b) and (c) as mentioned below, or all of components (a) to (c) as mentioned below, and the component (b) contains a precursor that can be decomposed by the action of an acid to produce a compound represented by formula (A). |
| priorityDate | 2017-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 263.